SUSS MA-8 Aligner
Contact mask aligner that transfers mask pattern to the photoresist layer on the substrate. Infrared backside mask alignment feature. Capable of handling up to 200 mm wafers, and 7”x7” and 9”x9” masks.
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- Facilities & Equipment
- Bioactive Materials Characterization
- Combinatorial Science
- Design
- Polymer Synthesis
- Polymer Screening
- Coating Preparation
- Coating Deposition
- Coating Screening
- Analysis
- Electronics Design
- Electronics Prototype Fabrication
- Advanced Chip Packaging & Assembly
- Process Support Equipment
- Test & Inspection
- Fluidic Self Assembly
- Wafer Processing
- Materials Characterization
- RFID Lab - RWSL